March Plasma Systems has release of an improved version of its AP-1000 plasma system for high-volume plasma processing of semiconductor and microelectronics devices. The current system has a large installed base at customer sites worldwide, with over 200 systems currently in the field. The redesigned version provides the same production-proven plasma technology and performance in a smaller, more compact and easier-to-service design.
 
"Every square inch of clean room and manufacturing space is valuable," said Peter Bierhuis, president. "We have improved the new AP-1000 system to consume 24% less actual floor space than before, and 45% less effective floor space when you include all of the required maintenance areas. We have also moved key components to make them more accessible and easier to service. An added benefit for large-scale manufacturing facilities is that more AP-1000 systems can be placed side-by-side in a smaller area because now the chassis is smaller, there are no required maintenance areas at the sides of the system, and the plasma chamber door has been redesigned."

 
The system is capable of a variety of plasma modes and can handle a range of plasma gasses. March specifically designed the new system with existing customers in mind so that process re-qualification is not required when switching to the improved system. Accordingly, new system process performance is guaranteed for customers with copy-exact requirements.


March Plasma Systems, marchplasma.com
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