MANASSAS, VA – ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions in the electronics manufacturing and semiconductor industries, is pleased to announce that it will host “DI-water vs. Chemistry” on Thursday, April 27, from 1:30 PM to 2:30 PM EDT.  This is the second installment of the ZESTRON Academy 2017 Cleaning Webinar Series, and will be presented by our Application Technology Manager, Umut Tosun, M.S.Ch.E.

Increased densities, reduced component sizes and standoff heights as well as a large variety of component packages combine to limit the effectiveness of cleaning with DI-water. This webinar addresses cleaning agent alternatives to pure DI-water processes that will produce the required cleanliness levels and thereby guarantee the long-term reliability of assemblies.

“We invite both new and experienced industry members to attend this free session as we’ll review the effectiveness of cleaning underneath low standoff components using both DI-water and an aqueous-based engineered cleaning agent” said Sal Sparacino, Sales and Marketing Manager, ZESTRON.
For more information or to register for this free event, visit here.

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